Flare management for 40-nm logic devices

Yuusuke Tanaka; Takao Tamura; Masashi Fujimoto; Kyoichi Tsubata; Naka Onoda; Kiyoshi Fujii

doi:10.1117/12.2010082

12 April 2013 Flare management for 40-nm logic devices

Yuusuke Tanaka, Takao Tamura, Masashi Fujimoto, Kyoichi Tsubata, Naka Onoda, Kiyoshi Fujii

Proceedings Volume 8683, Optical Microlithography XXVI; 86832E (2013) https://doi.org/10.1117/12.2010082
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Since flare-related CD variation was observed in some 40-nm test chips, we evaluated the flare level of an ArF immersion scanner by the Kirk method. We found that the tool flare for a 1.3-μm pad was more than 5% and the short-range flare (scattering range < 10 μm) was quite large when the optics were degraded. Optics maintenance reduced the tool flare to about 2%. An evaluation of the impact of short-range flare on the space CDs of 40-nm logic devices revealed it to be quite large. The point spread function for flare was determined from measured flare data, and the flare density was calculated for various patterns. A simulation analysis showed that the measured CD error was closely related to flare density. Since the impact of a change in dose on space CD is nonlinear, the impact of a change in flare is also nonlinear. Simulations using tool flare and flare density can predict most of the CD error. In the active layer of 40-nm logic devices, the flare density is generally in the range of 40-70% for critical space patterns. Varying the dose control pattern from small-area L/S (< 5 μm square) to large-area L/S (50 μm square) should reduce the impact of flare on space CD. Patterns with a medium flare density are preferable for dose control.

Citation Download Citation

Yuusuke Tanaka, Takao Tamura, Masashi Fujimoto, Kyoichi Tsubata, Naka Onoda, and Kiyoshi Fujii "Flare management for 40-nm logic devices", Proc. SPIE 8683, Optical Microlithography XXVI, 86832E (12 April 2013); https://doi.org/10.1117/12.2010082

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Logic devices

Point spread functions

Critical dimension metrology

Error analysis

Cadmium

Photomasks

Scanners

Show All Keywords

Keywords/Phrases

Search In:

Publication Years