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Proceedings Article

Silica-based UV-fibers for DUV applications: current status

[+] Author Affiliations
K.-F. Klein, C. P. Gonschior, D. Beer

Technische Hochschule Mittelhessen (Germany)

H.-S. Eckhardt

Tec5 AG (Germany)

M. Belz

World Precision Instruments Deutschland GmbH (Germany)

J. Shannon, V. Khalilov

Polymicro Technologies, A Subsidiary of Molex Inc. (United States)

M. Klein, C. Jakob

TransMIT GmbH (Germany)

Proc. SPIE 8775, Micro-structured and Specialty Optical Fibres II, 87750B (May 3, 2013); doi:10.1117/12.2020993
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From Conference Volume 8775

  • Micro-structured and Specialty Optical Fibres II
  • Kyriacos Kalli; Jiri Kanka; Alexis Mendez
  • Prague, Czech Republic | April 15, 2013

abstract

The current status of UV-damage in several different UV fibers due to defects in their synthetic high-OH silica core and cladding will be described. Further, steps to improve UV resistance and adequate measurement techniques based on a deuterium lamp setup are included. For the first time, the main parameters and their influences on UV induced losses are discussed in detail with an emphasis towards future standardization purposes. Applications based on two new UV light sources, a laser driven xenon plasma broad band source and a high pulse-power 355 nm Nd:YAG laser, are introduced. UV photo-darkening and -bleaching in UV fibers caused by this extremely powerful light source is demonstrated. Finally, first results on transmission of UV light in optical fibers at cryogenic temperatures are shown. © (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

K.-F. Klein ; C. P. Gonschior ; D. Beer ; H.-S. Eckhardt ; M. Belz, et al.
" Silica-based UV-fibers for DUV applications: current status ", Proc. SPIE 8775, Micro-structured and Specialty Optical Fibres II, 87750B (May 3, 2013); doi:10.1117/12.2020993; http://dx.doi.org/10.1117/12.2020993


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