The effect of line roughness on DUV scatterometry

Mark-Alexander Henn; Sebastian Heidenreich; Hermann Gross; Bernd Bodermann; Markus Bär

doi:10.1117/12.2020761

13 May 2013 The effect of line roughness on DUV scatterometry

Mark-Alexander Henn, Sebastian Heidenreich, Hermann Gross, Bernd Bodermann, Markus Bär

Proceedings Volume 8789, Modeling Aspects in Optical Metrology IV; 87890U (2013) https://doi.org/10.1117/12.2020761
Event: SPIE Optical Metrology 2013, 2013, Munich, Germany

Abstract

The impact of line-edge (LER) and line-width roughness (LWR) on the measured diffraction patters in extreme ultraviolet (EUV) scatterometry has been investigated in recent publications. Two-dimensional rigorous numerical simulations were carried out to model roughness. Simple analytical expressions for the bias in the mean efficiencies stemming from LER and LWR were obtained. Applying a similar approach for DUV scatterometry to investigate the impact of line roughness we obtain comparable results.

Citation Download Citation

Mark-Alexander Henn, Sebastian Heidenreich, Hermann Gross, Bernd Bodermann, and Markus Bär "The effect of line roughness on DUV scatterometry", Proc. SPIE 8789, Modeling Aspects in Optical Metrology IV, 87890U (13 May 2013); https://doi.org/10.1117/12.2020761

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