A study of the defect detection technology using the optic simulation for the semiconductor device

Yusin Yang; Yongdeok Jeong; Mitsunori Numata; Mira Park; Mingoo Seo; SangKil Lee; ChungSam Jun; Kyupil Lee; Insoo Cho

doi:10.1117/12.2025977

9 September 2013 A study of the defect detection technology using the optic simulation for the semiconductor device

Yusin Yang, Yongdeok Jeong, Mitsunori Numata, Mira Park, Mingoo Seo, SangKil Lee, ChungSam Jun, Kyupil Lee, Insoo Cho

Proceedings Volume 8880, Photomask Technology 2013; 88801S (2013) https://doi.org/10.1117/12.2025977
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

In the era of sub-30nm devices, the size of the defects on semiconductor wafer has already exceeded the resolution limit of optic microscope, but we still can't help using optical inspection tools. Therefore, the contrast enhancement technique is more useful rather than the resolution itself. The best contrast can be taken by the optimized light conditions such as wavelength, polarization, incidence angle and so on. However these kinds of parameters are not easily estimated intuitively because they are strongly dependent on the pattern structures and materials. In this paper, we propose a simulation methodology to find those optic conditions to detect sub 20nm defect. The simulation is based on FDTD (Finite Difference Time Domain) calculation and Fourier optics.

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Yusin Yang, Yongdeok Jeong, Mitsunori Numata, Mira Park, Mingoo Seo, SangKil Lee, ChungSam Jun, Kyupil Lee, and Insoo Cho "A study of the defect detection technology using the optic simulation for the semiconductor device", Proc. SPIE 8880, Photomask Technology 2013, 88801S (9 September 2013); https://doi.org/10.1117/12.2025977

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