Biomimetic antireflective AlInP nanostructures fabricated by lithography-free method for solar cell applications

Chan Il Yeo; Joon Beom Kim; Kwang Wook Park; Yong Tak Lee

doi:10.1117/12.2022507

25 September 2013 Biomimetic antireflective AlInP nanostructures fabricated by lithography-free method for solar cell applications

Chan Il Yeo, Joon Beom Kim, Kwang Wook Park, Yong Tak Lee

Author Affiliations +

Proceedings Volume 8824, Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion IV; 88240X (2013) https://doi.org/10.1117/12.2022507
Event: SPIE Solar Energy + Technology, 2013, San Diego, California, United States

Abstract

We present biomimetic antireflective AlInP nanostructures fabricated by inductively coupled plasma etching using Ag etch masks, which were easily formed by spin-coating Ag ink and subsequent sintering process on a hotplate without any lithography process and complicated equipments, for compound semiconductor based solar cell applications. This lithography-free technique is a simple, cost-effective, and high throughput method. The fabricated AlInP nanostructures demonstrated drastically reduced the hemispherical reflectance and solar-weighted reflectance (SWR) compared to that of bulk AlInP in the wavelength range of 300-870 nm. The incident angle-dependent SWR of the AlInP nanostructures remained below 4% up to an incident angle of 50°. Therefore, the biomimetic antireflective AlInP nanostructures fabricated by using the lithography-free method hold great potential for use in compound semiconductor based solar cell applications.

Citation Download Citation

Chan Il Yeo, Joon Beom Kim, Kwang Wook Park, and Yong Tak Lee "Biomimetic antireflective AlInP nanostructures fabricated by lithography-free method for solar cell applications", Proc. SPIE 8824, Next Generation (Nano) Photonic and Cell Technologies for Solar Energy Conversion IV, 88240X (25 September 2013); https://doi.org/10.1117/12.2022507

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