Thin crystal development and applications for hard x-ray free-electron lasers

Taito Osaka; Makina Yabashi; Yasuhisa Sano; Kensuke Tono; Yuichi Inubushi; Takahiro Sato; Kanade Ogawa; Satoshi Matsuyama; Tetsuya Ishikawa; Kazuto Yamauchi

doi:10.1117/12.2023465

27 September 2013 Thin crystal development and applications for hard x-ray free-electron lasers

Taito Osaka, Makina Yabashi, Yasuhisa Sano, Kensuke Tono, Yuichi Inubushi, Takahiro Sato, Kanade Ogawa, Satoshi Matsuyama, Tetsuya Ishikawa, Kazuto Yamauchi

Author Affiliations +

Proceedings Volume 8848, Advances in X-Ray/EUV Optics and Components VIII; 884804 (2013) https://doi.org/10.1117/12.2023465
Event: SPIE Optical Engineering + Applications, 2013, San Diego, California, United States

Abstract

We have developed a new method to fabricate ultrathin silicon single crystals, which can be used as spectral beam splitters for the hard x-ray regime, based on a reactive dry etching process using plasma at atmospheric pressure. The high crystalline perfection of the crystals was verified by both topographic and high-resolution rocking curve measurements using coherent x-rays at the 1-km-long beamline, BL29XUL of SPring-8. The development of thin crystals enables the construction of a split-delay unit and the provision of a dedicated branch for photon diagnostics. By using a 20-μm-thick Si(111) crystal in the symmetric Bragg geometry as a component of a Si(111) double-crystal monochromator, an arrival-time monitor using a destructive manner has been upgraded to a non-destructive method at SPring-8 Angstrom Compact free-electron LAser. Using the splitting crystals in a helium atmosphere can prevent oxidation, which can introduce a lattice distortion.

Citation Download Citation

Taito Osaka, Makina Yabashi, Yasuhisa Sano, Kensuke Tono, Yuichi Inubushi, Takahiro Sato, Kanade Ogawa, Satoshi Matsuyama, Tetsuya Ishikawa, and Kazuto Yamauchi "Thin crystal development and applications for hard x-ray free-electron lasers", Proc. SPIE 8848, Advances in X-Ray/EUV Optics and Components VIII, 884804 (27 September 2013); https://doi.org/10.1117/12.2023465

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