Paper
14 November 2013 Brewster angle thin film polarizing beamsplitter laser damage competition: “S” polarization
Christopher J. Stolz, Jeff Runkel
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Abstract
This Brewster angle thin film polarizer damage competition is a continuation of last year’s test with “P” polarization results published in 2012 and “S” polarization results in this study. This competition allows a direct laser resistance comparison between polarizations because the samples were laser damage tested under identical conditions. The requirements of the coatings are a minimum transmission of 95% at “P” polarization and minimum reflection of 99% at “S” polarization at 1064 nm and 56.4 degrees angle of incidence. The choice of coating materials, design, and deposition method were left to the participant. Laser damage testing was performed according to the ISO 11254 standard utilizing a 1064 nm wavelength laser with a 10 ns pulse length operating at 20 Hz. A double blind test assured sample and submitter anonymity. In addition to the laser resistance results, details of deposition processes, coating materials and layer count, and spectral results are shared.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher J. Stolz and Jeff Runkel "Brewster angle thin film polarizing beamsplitter laser damage competition: “S” polarization", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 888509 (14 November 2013); https://doi.org/10.1117/12.2030476
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CITATIONS
Cited by 6 scholarly publications.
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KEYWORDS
Polarization

Laser induced damage

Resistance

Thin film coatings

Thin films

Polarizers

Silica

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