Paper
26 December 2013 Four point probe geometry modified correction factor for determining resistivity
Fahid Algahtani, Karthikram B. Thulasiram, Nashrul M. Nasir, Anthony S. Holland
Author Affiliations +
Proceedings Volume 8923, Micro/Nano Materials, Devices, and Systems; 89235D (2013) https://doi.org/10.1117/12.2034057
Event: SPIE Micro+Nano Materials, Devices, and Applications, 2013, Melbourne, Victoria, Australia
Abstract
The four-point probe technique is well known for its use in determining sheet resistance and resistivity (or effective resistivity) of thin films. Using a standard four-point probe setup, relatively large area samples are required. The convention is that the distance from any probe in the probe arrangement should be at least ten times the probe spacing from the sample boundary in order to use the fixed correction factor. In this paper we show, using computer modelling, how accurate measurements can be made using appropriate correction factors for samples that are either small or of any thickness. For the significant extent of variations used, the correction factor does not vary significantly.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fahid Algahtani, Karthikram B. Thulasiram, Nashrul M. Nasir, and Anthony S. Holland "Four point probe geometry modified correction factor for determining resistivity", Proc. SPIE 8923, Micro/Nano Materials, Devices, and Systems, 89235D (26 December 2013); https://doi.org/10.1117/12.2034057
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Cited by 5 scholarly publications.
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KEYWORDS
Resistance

Modeling

Thin films

Finite element methods

Computer simulations

Analytical research

Computer engineering

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