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19 February 2014 High-performance photonic crystal membrane reflectors by magnetically guided metal-assisted chemical etching
Yichen Shuai, Karthik Balasundaram, Parsian K. Mohseni, Deyin Zhao, Hongjun Yang, Xiuling Li, Weidong Zhou
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Abstract
Based on Fano resonance principles in photonic crystals, high performance broadband reflectors can be realized with 100% reflection. Applying an innovative magnetic field guided metal-assisted chemical etching (MacEtch) process, we report here high performance membrane reflectors on SOI with controlled sidewall etching and high reflection around 1550 nm. This work represents the first demonstration of magnetically guided MacEtch (h-MacEtch) of periodic arrays of discrete nanoholes of sub-micron dimensions. Such an innovative process can lead to facile formation of large area 2D and 3D nanoscale-structures, for high performance photonic crystal membrane reflectors, filters, and metamaterials.
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Yichen Shuai, Karthik Balasundaram, Parsian K. Mohseni, Deyin Zhao, Hongjun Yang, Xiuling Li, and Weidong Zhou "High-performance photonic crystal membrane reflectors by magnetically guided metal-assisted chemical etching", Proc. SPIE 8994, Photonic and Phononic Properties of Engineered Nanostructures IV, 899409 (19 February 2014); https://doi.org/10.1117/12.2040249
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KEYWORDS
Metals

Reflectors

Magnetism

Photonic crystals

Etching

Wet etching

Silicon

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