Wafer-level radiometric performance testing of uncooled microbolometer arrays

Denis G. Dufour; Patrice Topart; Bruno Tremblay; Christian Julien; Louis Martin; Carl Vachon

doi:10.1117/12.2040201

7 March 2014 Wafer-level radiometric performance testing of uncooled microbolometer arrays

Denis G. Dufour, Patrice Topart, Bruno Tremblay, Christian Julien, Louis Martin, Carl Vachon

Proceedings Volume 8975, Reliability, Packaging, Testing, and Characterization of MOEMS/MEMS, Nanodevices, and Nanomaterials XIII; 89750C (2014) https://doi.org/10.1117/12.2040201
Event: SPIE MOEMS-MEMS, 2014, San Francisco, California, United States

Abstract

A turn-key semi-automated test system was constructed to perform on-wafer testing of microbolometer arrays. The system allows for testing of several performance characteristics of ROIC-fabricated microbolometer arrays including NETD, SiTF, ROIC functionality, noise and matrix operability, both before and after microbolometer fabrication. The system accepts wafers up to 8 inches in diameter and performs automated wafer die mapping using a microscope camera. Once wafer mapping is completed, a custom-designed quick insertion 8-12 μm AR-coated Germanium viewport is placed and the chamber is pumped down to below 10^-5 Torr, allowing for the evaluation of package-level focal plane array (FPA) performance. The probe card is electrically connected to an INO IRXCAM camera core, a versatile system that can be adapted to many types of ROICs using custom-built interface printed circuit boards (PCBs). We currently have the capability for testing 384x288, 35 μm pixel size and 160x120, 52 μm pixel size FPAs. For accurate NETD measurements, the system is designed to provide an F/1 view of two rail-mounted blackbodies seen through the Germanium window by the die under test. A master control computer automates the alignment of the probe card to the dies, the positioning of the blackbodies, FPA image frame acquisition using IRXCAM, as well as data analysis and storage. Radiometric measurement precision has been validated by packaging dies measured by the automated probing system and re-measuring the SiTF and Noise using INO’s pre-existing benchtop system.

Citation Download Citation

Denis G. Dufour, Patrice Topart, Bruno Tremblay, Christian Julien, Louis Martin, and Carl Vachon "Wafer-level radiometric performance testing of uncooled microbolometer arrays", Proc. SPIE 8975, Reliability, Packaging, Testing, and Characterization of MOEMS/MEMS, Nanodevices, and Nanomaterials XIII, 89750C (7 March 2014); https://doi.org/10.1117/12.2040201

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KEYWORDS

Staring arrays

Microbolometers

Semiconducting wafers

Indium oxide

Black bodies

Readout integrated circuits

Cameras

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