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Proceedings Article

Decreasing curing temperature of spin-on dielectrics by using additives

[+] Author Affiliations
Jin Hee Bae, Kwen Woo Han, Eun Su Park, Hui Chan Yoon, Yoong Hee Na, Jin Woo Seo, Wan Hee Lim, Bo Sun Kim, Jun Young Jang, Younjin Cho

Cheil Industries Inc. (Korea, Republic of)

Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511R (March 27, 2014); doi:10.1117/12.2046098
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From Conference Volume 9051

  • Advances in Patterning Materials and Processes XXXI
  • Thomas I. Wallow; Christoph K. Hohle
  • San Jose, California, USA | February 23, 2014

abstract

Spin-on dielectric (SOD) is widely used in semiconductor industry, to form insulating layers including shallow trench isolation (STI) or inter-layer dielectrics (ILD). SOD has several advantages over high density plasma chemical vapor deposition (HDP-CVD) for manufacturing process, such as less defect and higher throughput. However, both SOD and HDP-CVD have a drawback, which is a high temperature curing process required to make pure silicon oxide layers. High temperature curing could cause high stress and thermal distortion. These disadvantages are becoming more problematic as the semiconductor device shrinks. To resolve the problem, we tested several additives to moderate the curing temperature. It was found out that amine compounds were effective to convert SOD polymer into silicon oxide, therefore the curing process could be performed at a lower temperature. We also observed that the SOD films containing amine additives have higher etch resistance during a wet etch process. These results, as well as the lower curing temperature, are beneficial for manufacturing insulating layers. Further investigation is ongoing to characterize other film properties of the SOD with additives, and to optimize the formulation conditions according to the requirements of manufacturing processes. © (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Jin Hee Bae ; Kwen Woo Han ; Eun Su Park ; Hui Chan Yoon ; Yoong Hee Na, et al.
" Decreasing curing temperature of spin-on dielectrics by using additives ", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511R (March 27, 2014); doi:10.1117/12.2046098; http://dx.doi.org/10.1117/12.2046098


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