Study of acid diffusion behaves form PAG by using top coat method

Atsushi Sekiguchi; Yoko Matsumoto

doi:10.1117/12.2043205

27 March 2014 Study of acid diffusion behaves form PAG by using top coat method

Atsushi Sekiguchi, Yoko Matsumoto

Proceedings Volume 9051, Advances in Patterning Materials and Processes XXXI; 90511S (2014) https://doi.org/10.1117/12.2043205
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Our past research on measurements of simulation parameters for ArF resists focused on establishing methods for measuring the following parameters:[1]-[4] • Development parameters[1] • PEB parameters[2] • Dill’s ABC parameters[3] • Quencher parameter[4] We entered these parameters into a lithography simulator and performed ArF resist simulations.We then explored ways to optimize the ArF resist material and process. This paper reports on our study of methods for measuring the diffusion length of acid generated from PAG during exposures. In our experiment, we applied a PAG-containing top coat (TC) material (second layer) to a PAG-free ArF resist (first layer), then performed the exposure and PEB processes. The acid generated in the TC during the exposure diffused into the ArF resist in the lower layer (first layer) when PEB was performed. The process of developing this sample removed the TC in the second layer and the parts of the first layer into which the acid had diffused.We obtained the acid diffusion length based on the quantity of film removed by the development. We calculated the acid diffusion coefficient after varying the exposure value and repeating the measurement. For this report, we also performed measurements to determine how differences in PAG anion size, amount of quencher additive, and PEB temperature affected the acid diffusion coefficient.We entered the measurements obtained into the PROLITH simulator and explored the effects of acid diffusion on pattern profile.

Citation Download Citation

Atsushi Sekiguchi and Yoko Matsumoto "Study of acid diffusion behaves form PAG by using top coat method", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511S (27 March 2014); https://doi.org/10.1117/12.2043205

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available