Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever

Marcus Kaestner; Konrad Nieradka; Tzvetan Ivanov; Steve Lenk; Yana Krivoshapkina; Ahmad Ahmad; Tihomir Angelov; Elshad Guliyev; Alexander Reum; Matthias Budden; Tomas Hrasok; Manuel Hofer; Christian Neuber; Ivo W. Rangelow

doi:10.1117/12.2046973

28 March 2014 Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever

Marcus Kaestner, Konrad Nieradka, Tzvetan Ivanov, Steve Lenk, Yana Krivoshapkina, Ahmad Ahmad, Tihomir Angelov, Elshad Guliyev, Alexander Reum, Matthias Budden, Tomas Hrasok, Manuel Hofer, Christian Neuber, Ivo W. Rangelow

Author Affiliations +

Proceedings Volume 9049, Alternative Lithographic Technologies VI; 90490C (2014) https://doi.org/10.1117/12.2046973
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Within last two years, we have shown the positive-tone, development-less patterning of calixarene molecular glass resists using highly confined electric field, current-controlled scanning probe lithography scheme. Herein, we give a more detailed view insight describing the applied Scanning Probe Lithography (SPL) technology platform applying selfactuating, self-sensing cantilever. The experimental results are supported by first preliminary simulation results estimating the local electric field strength, the electron trajectories, and the current density distribution at the sample surface. In addition, the diameter of Fowler-Nordheim electron beam, emitted from SPL-tip, was calculated as function of the bias voltage for different current set-points and tip radii. In experimental part we show the reproducible writing of meander line patterns as well as the patterning of individual features using specially developed pattern generator software tool.

Citation Download Citation

Marcus Kaestner, Konrad Nieradka, Tzvetan Ivanov, Steve Lenk, Yana Krivoshapkina, Ahmad Ahmad, Tihomir Angelov, Elshad Guliyev, Alexander Reum, Matthias Budden, Tomas Hrasok, Manuel Hofer, Christian Neuber, and Ivo W. Rangelow "Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever", Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490C (28 March 2014); https://doi.org/10.1117/12.2046973

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available