Applying ILT mask synthesis for co-optimizing design rules and DSA process characteristics

Thuc Dam; William Stanton

doi:10.1117/12.2046370

31 March 2014 Applying ILT mask synthesis for co-optimizing design rules and DSA process characteristics

Thuc Dam, William Stanton

Proceedings Volume 9052, Optical Microlithography XXVII; 90521B (2014) https://doi.org/10.1117/12.2046370
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

During early stage development of a DSA process, there are many unknown interactions between design, DSA process, RET, and mask synthesis. The computational resolution of these unknowns can guide development towards a common process space whereby manufacturing success can be evaluated. This paper will demonstrate the use of existing Inverse Lithography Technology (ILT) to co-optimize the multitude of parameters. ILT mask synthesis will be applied to a varied hole design space in combination with a range of DSA model parameters under different illumination and RET conditions. The design will range from 40 nm pitch doublet to random DSA designs with larger pitches, while various effective DSA characteristics of shrink bias and corner smoothing will be assumed for the DSA model during optimization. The co-optimization of these design parameters and process characteristics under different SMO solutions and RET conditions (dark/bright field tones and binary/PSM mask types) will also help to provide a complete process mapping of possible manufacturing options. The lithographic performances for masks within the optimized parameter space will be generated to show a common process space with the highest possibility for success.

Citation Download Citation

Thuc Dam and William Stanton "Applying ILT mask synthesis for co-optimizing design rules and DSA process characteristics", Proc. SPIE 9052, Optical Microlithography XXVII, 90521B (31 March 2014); https://doi.org/10.1117/12.2046370

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
16 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Lithography

Source mask optimization

Photovoltaics

Calibration

Directed self assembly

Lens design

Show All Keywords

Keywords/Phrases

Search In:

Publication Years