The measurement uncertainty of CD measurement in the optical measurement technology using Fourier image

Kuniharu Nagashima; Hideaki Abe; Makoto Oote; Yuichiro Yamazaki

doi:10.1117/12.2048759

2 April 2014 The measurement uncertainty of CD measurement in the optical measurement technology using Fourier image

Kuniharu Nagashima, Hideaki Abe, Makoto Oote, Yuichiro Yamazaki

Proceedings Volume 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII; 905034 (2014) https://doi.org/10.1117/12.2048759
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Optical metrology system is used as high sampling CD measurement. The optical measurement technology using Fourier image can obtain much information with various optical conditions. We evaluated Fourier image method for CD metrology. Various issues of the optical measurement technology were found for CD measurement uncertainty. Measurement uncertainty depends on the number of position on Fourier image, and measurement uncertainty is improved by using multiple positions data. Top CD value is influenced by under layer pattern CD variance and under layer thickness variance. Optical CD measurement technology is influenced by various process variation like under-layer structure, stacked film thickness, material changes and so on. If optical measurement system applies to CD metrology, Fourier image method should be used in development phase for unfixed process because high number of data and speedy process feedback in no under layer situation is needed.

Citation Download Citation

Kuniharu Nagashima, Hideaki Abe, Makoto Oote, and Yuichiro Yamazaki "The measurement uncertainty of CD measurement in the optical measurement technology using Fourier image", Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905034 (2 April 2014); https://doi.org/10.1117/12.2048759

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