The economic impact of EUV lithography on critical process modules

Arindam Mallik; Naoto Horiguchi; Jürgen Bömmels; Aaron Thean; Kathy Barla; Geert Vandenberghe; Kurt Ronse; Julien Ryckaert; Abdelkarim Mercha; Laith Altimime; Diederik Verkest; An Steegen

doi:10.1117/12.2046310

17 April 2014 The economic impact of EUV lithography on critical process modules

Arindam Mallik, Naoto Horiguchi, Jürgen Bömmels, Aaron Thean, Kathy Barla, Geert Vandenberghe, Kurt Ronse, Julien Ryckaert, Abdelkarim Mercha, Laith Altimime, Diederik Verkest, An Steegen

Author Affiliations +

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90481R (2014) https://doi.org/10.1117/12.2046310
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Traditionally, semiconductor density scaling has been supported by optical lithography. The ability of the exposure tools to provide shorter exposure wavelengths or higher numerical apertures have allowed optical lithography be on the forefront of dimensional scaling for the semiconductor industry. Unfortunately, the roadmap for lithography is currently at a juncture of a major paradigm shift. EUV Lithography is steadily maturing but not fully ready to be inserted into HVM. Unfortunately, there are no alternative litho candidates on the horizon that can take over from 193nm. As a result, it is important to look into the insertion point of EUV that would be ideal for the industry from an economical perspective. This paper details the benefit observed by such a transition. Furthermore, it looks into such detail with an EUV throughput sensitivity study.

Citation Download Citation

Arindam Mallik, Naoto Horiguchi, Jürgen Bömmels, Aaron Thean, Kathy Barla, Geert Vandenberghe, Kurt Ronse, Julien Ryckaert, Abdelkarim Mercha, Laith Altimime, Diederik Verkest, and An Steegen "The economic impact of EUV lithography on critical process modules", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481R (17 April 2014); https://doi.org/10.1117/12.2046310

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available