Laser produced plasma light source development for HVM

Igor V. Fomenkov; David C. Brandt; Nigel R. Farrar; Bruno La Fontaine; David W. Myers; Daniel J. Brown; Alex I. Ershov; Norbert R. Böwering; Daniel J. Riggs; Robert J. Rafac; Silvia De Dea; Michael Purvis; Rudy Peeters; Hans Meiling; Noreen Harned; Daniel Smith; Robert Kazinczi; Alberto Pirati

doi:10.1117/12.2048195

17 April 2014 Laser produced plasma light source development for HVM

Igor V. Fomenkov, David C. Brandt, Nigel R. Farrar, Bruno La Fontaine, David W. Myers, Daniel J. Brown, Alex I. Ershov, Norbert R. Böwering, Daniel J. Riggs, Robert J. Rafac, Silvia De Dea, Michael Purvis, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Robert Kazinczi, Alberto Pirati

Author Affiliations +

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 904835 (2014) https://doi.org/10.1117/12.2048195
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

This paper describes the development of a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193nm immersion double patterning technology for sub- 20nm critical layer patterning. In this paper we discuss the most recent results from high power testing on our development systems targeted at the 250W configuration, and describe the requirements and technical challenges related to successful implementation of these technologies. Subsystem performance will be shown including Conversion Efficiency (CE), dose control, collector protection and out-of-band (OOB) radiation measurements. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for a 250W HVM LPP source.

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Igor V. Fomenkov, David C. Brandt, Nigel R. Farrar, Bruno La Fontaine, David W. Myers, Daniel J. Brown, Alex I. Ershov, Norbert R. Böwering, Daniel J. Riggs, Robert J. Rafac, Silvia De Dea, Michael Purvis, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Robert Kazinczi, and Alberto Pirati "Laser produced plasma light source development for HVM", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904835 (17 April 2014); https://doi.org/10.1117/12.2048195

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