Ptychographic wavefront sensor for high-NA EUV inspection and exposure tools

Antoine Wojdyla; Ryan Miyakawa; Patrick Naulleau

doi:10.1117/12.2048386

17 April 2014 Ptychographic wavefront sensor for high-NA EUV inspection and exposure tools

Antoine Wojdyla, Ryan Miyakawa, Patrick Naulleau

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 904839 (2014) https://doi.org/10.1117/12.2048386
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

We present a novel approach for wavefront sensing based on scanning diffraction imaging suitable for high-NA optics inspection, where common metrology techniques show limitations. This approach employs ptychography, whereby a well-characterized object is scanned at the focus of the aberrated test optic, and the resulting scat tered light is captured on a CCD. Under the Fresnel approximation, the diffraction patterns are processed in an iterative algorithm to reconstruct the test optic aberrations. We discuss the applicability of this wavefront metrology, present numerical simulations that validate the reconstruction, and show first experimental results from an optical prototype.

Citation Download Citation

Antoine Wojdyla, Ryan Miyakawa, and Patrick Naulleau "Ptychographic wavefront sensor for high-NA EUV inspection and exposure tools", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904839 (17 April 2014); https://doi.org/10.1117/12.2048386

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