Paper
21 May 2014 Low-cost photonic crystals for spectral sensors fabricated using projection lithography
Tanya Cruz Garza, James I. Scholtz, Michael J. Gazes, Ioannis Kymissis, Nadia K. Pervez
Author Affiliations +
Abstract
Nanophotonic structures including photonic crystals and plasmonics have a lot of potential applications in spectral sensing. These devices typically require electron beam lithography, a slow process, for fabrication. Successful commercialization of these technologies requires reproducible, high volume fabrication. Projection lithography is an established process for rapid, reproducible patterning. We have successfully pushed the limits of projection lithography to develop a low-cost, high-throughput alternative to electron beam lithography for our nanoscale, visible-wavelength photonic crystal spectral sensors. The developed process is 100 times faster than electron beam lithography for 10mm by 10mm dies on a four inch wafer. Testing of the photonic crystals in spectral sensors shows uniformity in large scale production which is robust to defects from processing.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tanya Cruz Garza, James I. Scholtz, Michael J. Gazes, Ioannis Kymissis, and Nadia K. Pervez "Low-cost photonic crystals for spectral sensors fabricated using projection lithography", Proc. SPIE 9101, Next-Generation Spectroscopic Technologies VII, 91010F (21 May 2014); https://doi.org/10.1117/12.2053575
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KEYWORDS
Photonic crystals

Semiconducting wafers

Sensors

Deep ultraviolet

Electron beam lithography

Lithography

Scanning electron microscopy

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