Demands for Masks in 1.5μm Generation

Nozomu Izumi; Miwako Ando; Yoshiyuki Nagai; Nobuhiko Yabu

doi:10.1117/12.2065219

28 July 2014 Demands for masks in 1.5μm generation

Nozomu Izumi, Miwako Ando, Yoshiyuki Nagai, Nobuhiko Yabu

Proceedings Volume 9256, Photomask and Next-Generation Lithography Mask Technology XXI; 92560C (2014) https://doi.org/10.1117/12.2065219
Event: Photomask Japan 2014, 2014, Yokohama, Japan

Abstract

From late 1990s to 2000s, the demands for Flat Panel Displays (FPDs), represented by Liquid Crystal Displays (LCDs), were mainly for larger size and lower price. Consequently, the development of FPD exposure tools was focused on expansion of exposure area and high throughput. Today, however, due to rapid growth of application for mobile devices, such as Smartphones and Tablet PCs, high resolution FPDs are being needed, and exposure tools are being demanded to constantly print finer pattern than before. In order To meet such needs, in 2013, Canon has released MPAsp-E813 and MPAsp-H803 series, which can resolve 2.0μm Line and Space (L and S) pattern and 2.5μm Contact Hole (CH) pattern. However, FPD resolution for mobile devices is still getting higher and higher, and now extremely high resolution of 1.5μm L and S is already in great demand.

Citation Download Citation

Nozomu Izumi, Miwako Ando, Yoshiyuki Nagai, and Nobuhiko Yabu "Demands for masks in 1.5μm generation", Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 92560C (28 July 2014); https://doi.org/10.1117/12.2065219

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