A novel optical method for measuring the thin film stress

Yen-Chang Chu; Kun-Huang Chen; Jing-Heng Chen; Hua-Ken Tseng; Yu-Shiang Chang

doi:10.1117/12.2069833

21 August 2014 A novel optical method for measuring the thin film stress

Yen-Chang Chu, Kun-Huang Chen, Jing-Heng Chen, Hua-Ken Tseng, Yu-Shiang Chang

Proceedings Volume 9233, International Symposium on Photonics and Optoelectronics 2014; 92331V (2014) https://doi.org/10.1117/12.2069833
Event: International Symposium on Photonics and Optoelectronics (SOPO 2014), 2014, Suzhou, China

Abstract

This paper proposes a thin-film stress measurement system. By applying a constant velocity to the projection grating along the grating plane, a series of sampling points of the sinusoidal wave can be recorded using a CCD camera. The phase distribution of the optimized heterodyne moiré signal can be extracted by the least-squares sine fitting algorithm and then the surface profile of the tested flexible substrate can subsequently be acquired. Using polynomial fitting method to depict the cross-section curve of the substrate, estimating the resultant curvature radii of the uncoated and coated substrates, and substituting these two radii into the corrected Stoney formula, the thin-film stress of the flexible substrate can consequently be obtained. This method features high stability and high resolution due to the introduction of the projection moiré and heterodyne interferometry.

Citation Download Citation

Yen-Chang Chu, Kun-Huang Chen, Jing-Heng Chen, Hua-Ken Tseng, and Yu-Shiang Chang "A novel optical method for measuring the thin film stress", Proc. SPIE 9233, International Symposium on Photonics and Optoelectronics 2014, 92331V (21 August 2014); https://doi.org/10.1117/12.2069833

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