Recent advances of the metrological AFM at INRIM

R. Bellotti; G. B. Picotto

doi:10.1117/12.2061954

27 August 2014 Recent advances of the metrological AFM at INRIM

R. Bellotti, G. B. Picotto

Proceedings Volume 9173, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VIII; 917304 (2014) https://doi.org/10.1117/12.2061954
Event: SPIE NanoScience + Engineering, 2014, San Diego, California, United States

Abstract

Traceable dimensional measurements of step-height and lateral standards, patterned surfaces, and particles at the nanoscale need of calibrated instruments such as the metrological AFMs. These instruments have onboard capacitive sensors or interferometers to control the relative tip-sample movements. Interferometers provide a direct traceability to the unit of length, at the cost of more complex set-ups. A new interferometer set-up has been developed to monitor tip-sample z-displacements of the instrument in use at INRIM. The interferometer is made of a compact and symmetric arrangement of the optics to fit available room and minimize the metrology loop. Preliminary results are reported together with the analysis of the main error sources of z-displacement measurements.

Citation Download Citation

R. Bellotti and G. B. Picotto "Recent advances of the metrological AFM at INRIM", Proc. SPIE 9173, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VIII, 917304 (27 August 2014); https://doi.org/10.1117/12.2061954

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