Chromatic error correction of diffractive optical elements at minimum etch depths

Jochen Barth; Tobias Gühne

doi:10.1117/12.2061000

25 September 2014 Chromatic error correction of diffractive optical elements at minimum etch depths

Jochen Barth, Tobias Gühne

Proceedings Volume 9192, Current Developments in Lens Design and Optical Engineering XV; 91920J (2014) https://doi.org/10.1117/12.2061000
Event: SPIE Optical Engineering + Applications, 2014, San Diego, California, United States

Abstract

The integration of diffractive optical elements (DOE) into an optical design opens up new possibilities for applications in sensing and illumination. If the resulting optics is used in a larger spectral range we must correct not only the chromatic error of the conventional, refractive, part of the design but also of the DOE. We present a simple but effective strategy to select substrates which allow the minimum etch depths for the DOEs. The selection depends on both the refractive index and the dispersion.

Citation Download Citation

Jochen Barth and Tobias Gühne "Chromatic error correction of diffractive optical elements at minimum etch depths", Proc. SPIE 9192, Current Developments in Lens Design and Optical Engineering XV, 91920J (25 September 2014); https://doi.org/10.1117/12.2061000

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