Design of beam expander for 90-nm lithography tool

Han Xing; Li Lin; Ma Bin

doi:10.1117/12.2067855

21 November 2014 Design of beam expander for 90-nm lithography tool

Han Xing, Li Lin, Ma Bin

Proceedings Volume 9296, International Symposium on Optoelectronic Technology and Application 2014: Advanced Display Technology; Nonimaging Optics: Efficient Design for Illumination and Solar Concentration; 92960N (2014) https://doi.org/10.1117/12.2067855
Event: International Symposium on Optoelectronic Technology and Application 2014, 2014, Beijing, China

Abstract

Lithography tool is the most important equipment for microelectronics manufacturing industry. Lithography tool development is towards to improving resolution and uniformity, because of the miniaturization of modern electronics manufacturing. Illumination system in lithography plays a significant role in improving resolution and the uniformity. 193 nm ArF laser source is widely used in modern lithography design. The output beam size of the ArF source can’t satisfy the requirements of the following components, so the first task of illumination system is to design beam expander. Three different beam expanders for 193 nm ArF laser source are designed in this paper. The uniformity and threedimensional distribution of each beam expander’s exit beam are simulated and compared in the software of TracePro. Characteristics of the different beam expanding systems are analyzed. Afterwards the paper compares and summarizes the advantages and disadvantages of three expanding systems. At last the article gives some suggestions on choosing different beam expanding systems.

Citation Download Citation

Han Xing, Li Lin, and Ma Bin "Design of beam expander for 90-nm lithography tool", Proc. SPIE 9296, International Symposium on Optoelectronic Technology and Application 2014: Advanced Display Technology; Nonimaging Optics: Efficient Design for Illumination and Solar Concentration, 92960N (21 November 2014); https://doi.org/10.1117/12.2067855

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