Paper
18 December 2014 Infrared transparent conductive films
Fei Tao, Wei-guo Sun, Liang Zhang, Li-wen Wang, Lei Zhang, Xu-bo Zhu
Author Affiliations +
Abstract
This paper presents results for films of CuAlxOy were deposited on the sapphire by reactive magnetron co-sputtering using DC applied to the high-purity Cu target,RF applied to the high-purity Al target.Copper aluminum oxide film (CuAlxOy) is transparent for infrared and conductive. The properties of the films are influenced by the power of sputtering,the thickness of films etc. deposition parameters. It has been found that, by fine-tuning the sputtering parameters, the films with both reasonably low resistance and high transmission can be obtained simultaneously.The relationship between the process parameters and the properties of the films were established, the process parameters is very important for preparation of the films later.The relationship between the average transmittance, electrical conductivity and thickness of the films etc. parameters were set up.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fei Tao, Wei-guo Sun, Liang Zhang, Li-wen Wang, Lei Zhang, and Xu-bo Zhu "Infrared transparent conductive films", Proc. SPIE 9295, International Symposium on Optoelectronic Technology and Application 2014: Laser Materials Processing; and Micro/Nano Technologies, 929508 (18 December 2014); https://doi.org/10.1117/12.2072889
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KEYWORDS
Sputter deposition

Copper

Oxygen

Aluminum

Transparent conducting films

Argon

Infrared radiation

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