In-situ and real time stress of 30.4-nmMo/Si multilayer mirror for the moon-based EUV camera

Yun-peng Li; Bo Chen; Fei He; Hua-bin Yang; Xiao-duo Wang; Xin Zheng; Xiao-dong Wang; Hong-ji Zhang; Hai-feng Wang; Jian-lin Cao

doi:10.1117/12.2073023

18 December 2014 In-situ and real time stress of 30.4 nm Mo/Si multilayer mirror for the moon-based EUV Camera

Yun-peng Li, Bo Chen, Fei He, Hua-bin Yang, Xiao-duo Wang, Xin Zheng, Xiao-dong Wang, Hong-ji Zhang, Hai-feng Wang, Jian-lin Cao

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Proceedings Volume 9295, International Symposium on Optoelectronic Technology and Application 2014: Laser Materials Processing; and Micro/Nano Technologies; 929509 (2014) https://doi.org/10.1117/12.2073023
Event: International Symposium on Optoelectronic Technology and Application 2014, 2014, Beijing, China

Abstract

Applications of Mo/Si multilayer mirrors for the moon-based extreme ultraviolet Camera (EUVC) require not only the minimal residual stress, but also little stress changes in the temperature environment on lunar surface. Hence, we deposit the 16.5 nm period Mo/Si multilayer mirror with a low as-deposited residual stress of -36 Mpa (compressive). The in-situ and real time stress tests are measured in the temperature cycling range from 20 °C to 130 °C. The results indicate that the stress gradually increases to the maximum of -100 MPa when heating up to 105 °C, then it gradually relaxes to 10 Mpa after thermal cycling to 130 °C. Such stress change has little influence on the performance of the Mo/Si multilayer mirror.

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Yun-peng Li, Bo Chen, Fei He, Hua-bin Yang, Xiao-duo Wang, Xin Zheng, Xiao-dong Wang, Hong-ji Zhang, Hai-feng Wang, and Jian-lin Cao "In-situ and real time stress of 30.4 nm Mo/Si multilayer mirror for the moon-based EUV Camera", Proc. SPIE 9295, International Symposium on Optoelectronic Technology and Application 2014: Laser Materials Processing; and Micro/Nano Technologies, 929509 (18 December 2014); https://doi.org/10.1117/12.2073023

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KEYWORDS

Multilayers

Mirrors

Temperature metrology

Photovoltaics

Extreme ultraviolet

Reflectivity

Cameras

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