Paper
13 March 2015 Investigation of facet-dependent InGaN growth for core-shell LEDs
Ionut Girgel, Paul R. Edwards, Emmanuel Le Boulbar, Duncan W.E. Allsopp, Robert W. Martin, Philip A. Shields
Author Affiliations +
Proceedings Volume 9363, Gallium Nitride Materials and Devices X; 93631V (2015) https://doi.org/10.1117/12.2077625
Event: SPIE OPTO, 2015, San Francisco, California, United States
Abstract
In this work we used vertically aligned GaN nanowires with well-defined crystal facets, i.e. the {11-20} a-plane, {10-10} m-plane, (0001) c-plane and {1-101} semi-polar planes, to investigate the impact of MOVPE reactor parameters on the characteristics of an InGaN layer. The morphology and optical characteristics of the InGaN layers grown of each facet were investigated by cathodoluminescence (CL) hyperspectral imaging and scanning electron microscopy (SEM). The influence of reactor parameters on growth rate and alloy fraction were determined and compared. The study revealed that pressure can have an important impact on the incorporation of InN on the {10-10} m-plane facets. The growth performed at 750°C and 100mbar led to a homogeneous high InN fraction of 25% on the {10-10} facets of the nanowires. This work suggests homogeneous good quality GaN/InGaN core-shell structure could be grown in the near future.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ionut Girgel, Paul R. Edwards, Emmanuel Le Boulbar, Duncan W.E. Allsopp, Robert W. Martin, and Philip A. Shields "Investigation of facet-dependent InGaN growth for core-shell LEDs", Proc. SPIE 9363, Gallium Nitride Materials and Devices X, 93631V (13 March 2015); https://doi.org/10.1117/12.2077625
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KEYWORDS
Indium gallium nitride

Indium nitride

Gallium nitride

Light emitting diodes

Scanning electron microscopy

Nanowires

Crystals

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