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Proceedings Article

Parallel fabrication of wafer-scale plasmonic metamaterials for nano-optics

[+] Author Affiliations
S. Eslami, J. G. Gibbs, A G. Mark, T. C. Lee, H.- H. Jeong, I. Kim

Max-Planck-Institut für Intelligente Systeme (Germany)

P. Fischer

Max-Planck Institut für Intelligente Systeme (Germany)

Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 93740R (March 13, 2015); doi:10.1117/12.2080098
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From Conference Volume 9374

  • Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
  • Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf; Henry Helvajian
  • San Francisco, California, United States | February 07, 2015

abstract

We describe how physical vapor deposition coupled with micelle-nanolithography-seeded substrates permits the growth of metamaterials with 3D structural and material control at the nanoscale. Novel plasmonic hybrid structures with tuned optical response from the UV to the near IR are demonstrated. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

S. Eslami ; J. G. Gibbs ; A G. Mark ; T. C. Lee ; H.- H. Jeong, et al.
" Parallel fabrication of wafer-scale plasmonic metamaterials for nano-optics ", Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 93740R (March 13, 2015); doi:10.1117/12.2080098; http://dx.doi.org/10.1117/12.2080098


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