Collaborative work on reducing the intersite gaps in outgassing qualification

Soichi Inoue; Eishi Shiobara; Takeshi Sasami; Isamu Takagi; Yukiko Kikuchi; Toru Fujimori; Shinya Minegishi; Robert Berg; Thomas Lucatorto; Shannon Hill; Charles Tarrio; Ivan Pollentier; Yen-Chih Lin; Yu-Jen Fan; Dominic Ashworth

doi:10.1117/12.2085700

13 March 2015 Collaborative work on reducing the intersite gaps in outgassing qualification

Soichi Inoue, Eishi Shiobara, Takeshi Sasami, Isamu Takagi, Yukiko Kikuchi, Toru Fujimori, Shinya Minegishi, Robert Berg, Thomas Lucatorto, Shannon Hill, Charles Tarrio, Ivan Pollentier, Yen-Chih Lin, Yu-Jen Fan, Dominic Ashworth

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 942212 (2015) https://doi.org/10.1117/12.2085700
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

This paper reports on an all-out effort to reduce the intersite gap of the resist outgassing contamination growth in the results obtained under the round-robin scheme. All test sites collaborated to determine the causes of such gaps. First, it was determined that wafer temperature during exposure could impact the amount of contamination growth. We discovered a huge intersite gap of wafer temperatures among the sites by using a wafer-shaped remote thermometer with wireless transmitting capability. Second, whether the contamination-limited regime was attained during testing could have been another primary root cause for such a difference. We found that for one of the model resists whose protecting unit had lower activation energy and molecular weight the contamination-limited regime was insufficient at one test site. Third, the ratio of the exposed area to pumping speed is necessary to equalize contamination growth. We validated the effect of matching the ratio of exposure area to pumping speed on reducing the intersite gap. This study and the protocols put in place should reduce the intersite gap dramatically.

Citation Download Citation

Soichi Inoue, Eishi Shiobara, Takeshi Sasami, Isamu Takagi, Yukiko Kikuchi, Toru Fujimori, Shinya Minegishi, Robert Berg, Thomas Lucatorto, Shannon Hill, Charles Tarrio, Ivan Pollentier, Yen-Chih Lin, Yu-Jen Fan, and Dominic Ashworth "Collaborative work on reducing the intersite gaps in outgassing qualification", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942212 (13 March 2015); https://doi.org/10.1117/12.2085700

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available