Key components technology update of 100W HVM EUV source

Taku Yamazaki; Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Yasufumi Kawasuji; Takeshi Okamoto; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Takeshi Kodama; Yutaka Shiraishi; Shinji Okazaki; Takashi Saitou

doi:10.1117/12.2180269

13 March 2015 Key components technology update of 100W HVM EUV source

Taku Yamazaki, Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Shinji Okazaki, Takashi Saitou

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94222P (2015) https://doi.org/10.1117/12.2180269
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

This paper introduces key components technology update of 100 W HVM LPP-EUV (laser produced plasma extreme ultraviolet) source which enable sub-10 nm critical layer patterning. This light source system is composed of several key components and each has its innovating, key and original technology. They are perfectly controlled and work harmoniously to produce stable plasma and provide high power EUV light in long term to the photolithography equipment. This paper describes the latest results obtained from our proto systems and test stands which support one hundred watt HVM LPP-EUV light source. Key components performance with experimental data and measurements are reported, such as high power short pulse CO2 drive laser, unique pre-pulse laser technology, very small droplet generation, magnetic debris mitigation, laser-droplet shooting control and etc.

Citation Download Citation

Taku Yamazaki, Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Yasufumi Kawasuji, Takeshi Okamoto, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Shinji Okazaki, and Takashi Saitou "Key components technology update of 100W HVM EUV source", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94222P (13 March 2015); https://doi.org/10.1117/12.2180269

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