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Proceedings Article

Customization and design of directed self-assembly using hybrid prepatterns

[+] Author Affiliations
Joy Cheng, Gregory S. Doerk, Charles T. Rettner, Gurpreet Singh, Melia Tjio, Hoa Truong, Noel Arellano, Srinivasan Balakrishnan, Markus Brink, Daniel P. Sanders

IBM Research - Almaden (United States)

Hsinyu Tsai, Michael Guillorn

IBM Research - Yorktown (United States)

Chi-Chun Liu

IBM Corp. (United States)

Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942307 (March 19, 2015); doi:10.1117/12.2086973
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From Conference Volume 9423

  • Alternative Lithographic Technologies VII
  • Douglas J. Resnick; Christopher Bencher
  • San Jose, California, United States | February 22, 2015

abstract

Diminishing error tolerance renders the customization of patterns created through directed self-assembly (DSA) extremely challenging at tighter pitch. A self-aligned customization scheme can be achieved using a hybrid prepattern comprising both organic and inorganic regions that serves as a guiding prepattern to direct the self-assembly of the block copolymers as well as a cut mask pattern for the DSA arrays aligned to it. In this paper, chemoepitaxy-based self-aligned customization is demonstrated using two types of organic-inorganic prepatterns. CHEETAH prepattern for “CHemoepitaxy Etch Trim using a self-Aligned Hardmask” of preferential hydrogen silsesquioxane (HSQ, inorganic resist), non-preferential organic underlayer is fabricated using electron beam lithography. Customized trench or hole arrays can be achieved through co-transfer of DSA-formed arrays and CHEETAH prepattern. Herein, we also introduce a tone-reversed version called reverse-CHEETAH (or rCHEETAH) in which customized line segments can be achieved through co-transfer of DSA-formed arrays formed on a prepattern wherein the inorganic HSQ regions are nonpreferential and the organic regions are PMMA preferential. Examples of two-dimensional self-aligned customization including 25nm pitch fin structures and an 8-bar “IBM” illustrate the versatility of this customization scheme using rCHEETAH. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Joy Cheng ; Gregory S. Doerk ; Charles T. Rettner ; Gurpreet Singh ; Melia Tjio, et al.
" Customization and design of directed self-assembly using hybrid prepatterns ", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942307 (March 19, 2015); doi:10.1117/12.2086973; http://dx.doi.org/10.1117/12.2086973


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