Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing

Alan G. Jacobs; Clemens Liedel; Christopher K. Ober; Michael O. Thompson

doi:10.1117/12.2086057

19 March 2015 Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing

Alan G. Jacobs, Clemens Liedel, Christopher K. Ober, Michael O. Thompson

Proceedings Volume 9423, Alternative Lithographic Technologies VII; 942309 (2015) https://doi.org/10.1117/12.2086057
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Laser thermal annealing of PS-b-PMMA is shown to modify phase segregation within the milliseconds timeframe at temperatures from the glass transition to far above the order-disorder transition temperature. We report the kinetics of phase segregation of cylinder forming PS-b-PMMA (53.8 kg/mol, f_PS = 0.7) as probed by micro-beam grazing incidence small angle X-ray scattering. Structure evolution was probed as a function of peak temperature, time at temperature, and quench rate, with phase segregation readily occurring on millisecond time scales and at peak quench rates up to 10⁷ K/s. The final film morphology is dependent on both the anneal time and the quench rate to ambient. With heating to sufficiently high temperatures, the thermal history is erased yielding a final state is purely dependent on the quench rate.

Citation Download Citation

Alan G. Jacobs, Clemens Liedel, Christopher K. Ober, and Michael O. Thompson "Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942309 (19 March 2015); https://doi.org/10.1117/12.2086057

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