Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses

Jae Hong Park; Hyun Ik Jang; Jun Yong Park; Seok Woo Jeon; Woo Choong Kim; Hee Yeoun Kim; Chi Won Ahn

doi:10.1117/12.2080980

19 March 2015 Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses

Jae Hong Park, Hyun Ik Jang, Jun Yong Park, Seok Woo Jeon, Woo Choong Kim, Hee Yeoun Kim, Chi Won Ahn

Author Affiliations +

Proceedings Volume 9423, Alternative Lithographic Technologies VII; 94231N (2015) https://doi.org/10.1117/12.2080980
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro- or nano-scale sensors and actuators.

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Jae Hong Park, Hyun Ik Jang, Jun Yong Park, Seok Woo Jeon, Woo Choong Kim, Hee Yeoun Kim, and Chi Won Ahn "Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94231N (19 March 2015); https://doi.org/10.1117/12.2080980

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