Tilting of lamellar domains on neutral random copolymer brushes

Indranil Mitra; Nikhila Mahadevapuram; Joseph Strzalka; Gila E. Stein

doi:10.1117/12.2085676

19 March 2015 Tilting of lamellar domains on neutral random copolymer brushes

Indranil Mitra, Nikhila Mahadevapuram, Joseph Strzalka, Gila E. Stein

Proceedings Volume 9423, Alternative Lithographic Technologies VII; 942320 (2015) https://doi.org/10.1117/12.2085676
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Thin films of lamellar poly(styrene-b-methyl methacrylate) (PS-PMMA) block copolymers were prepared on brushed silicon substrates with a range of thicknesses. The brushes are expected to eliminate preferential interactions at the substrate, thereby enabling perpendicular domain orientations relative to the interfaces. Using a combination of surface microscopy and grazing incidence small-angle X-ray scattering, we demonstrate that i) the brushed substrates are weakly preferential to PMMA; and ii) the average lamellar domain orientation is perpendicular to the substrate, but some domains are mis-oriented by up to 40º. We propose that PMMA domains deform to increase their contact area at the slightly preferential substrate, and this behavior drives the formation of out-of-plane defects such as bent or tilted domains. These outcomes suggest that depth-resolved measurements are needed to fully optimize materials and processes for block copolymer lithography.

Citation Download Citation

Indranil Mitra, Nikhila Mahadevapuram, Joseph Strzalka, and Gila E. Stein "Tilting of lamellar domains on neutral random copolymer brushes", Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942320 (19 March 2015); https://doi.org/10.1117/12.2085676

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