Positive-tone EUV resists: complexes of platinum and palladium

Miriam Sortland; Ryan Del Re; James Passarelli; Jodi Hotalen; Michaela Vockenhuber; Yasin Ekinci; Mark Neisser; Daniel A. Freedman; Robert L. Brainard

doi:10.1117/12.2086598

19 March 2015 Positive-tone EUV resists: complexes of platinum and palladium

Miriam Sortland, Ryan Del Re, James Passarelli, Jodi Hotalen, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel A. Freedman, Robert L. Brainard

Author Affiliations +

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 942227 (2015) https://doi.org/10.1117/12.2086598
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

The EUV photoreactivity of platinum and palladium mononuclear complexes has been investigated. Many platinum and palladium complexes show little or no EUV sensitivity, however, we have found that metal carbonates and metal oxalates (L₂M(CO₃) and L₂M(C₂O₄); M = Pt or Pd) are sensitive to EUV. The metal-carbonates give negative tone behavior. The most interesting result is that the metal oxalates give first positive-tone EUV resists based on mono-nuclear organometallic compounds. In particular, (dppm)Pd(C₂O₄) (dppm = 1,1-Bis(diphenylphosphino)methane) (25) prints 30-nm dense lines with E_size of 50 mJ/cm². To improve the lithographic performance of (25), the processing conditions were studied. A bake study showed that bake affected sensitivity and dark loss very little, while dark loss worsened with development time. Derivatives of (25) were synthesized to explore the effect of molecular weight on resist sensitivity, but the study showed no correlation between molecular weight and sensitivity.

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Miriam Sortland, Ryan Del Re, James Passarelli, Jodi Hotalen, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel A. Freedman, and Robert L. Brainard "Positive-tone EUV resists: complexes of platinum and palladium", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942227 (19 March 2015); https://doi.org/10.1117/12.2086598

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