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Proceedings Article

Further advancing the throughput of a multi-beam SEM

[+] Author Affiliations
Thomas Kemen, Gregor Dellemann, Dirk Zeidler

Carl Zeiss Microscopy GmbH (Germany)

Matt Malloy

SEMATECH Inc. (United States)

Brad Thiel

SUNY Polytechnic Institute (United States)

Shawn Mikula, Winfried Denk

Max-Planck-Institute for Medical Research (Germany)

Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241U (March 19, 2015); doi:10.1117/12.2188560
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From Conference Volume 9424

  • Metrology, Inspection, and Process Control for Microlithography XXIX
  • Jason P. Cain; Martha I. Sanchez
  • San Jose, California, United States | February 22, 2015

abstract

Multiple electron beam SEMs enable detecting structures of few nanometer in diameter at much higher throughputs than possible with single beam electron microscopes at comparable electron probe parameters. Although recent multiple beam SEM development has already demonstrated a large speed increase1, higher throughputs are still required to match the needs of many semiconductor applications2. We demonstrate the next step in the development of multi-beam SEMs by increasing the number of beams and the current per beam. The modularity of the multi-beam concept ensures that design changes in the multi-beam SEM are minimized. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Thomas Kemen ; Matt Malloy ; Brad Thiel ; Shawn Mikula ; Winfried Denk, et al.
" Further advancing the throughput of a multi-beam SEM ", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241U (March 19, 2015); doi:10.1117/12.2188560; http://dx.doi.org/10.1117/12.2188560


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