High-sensitivity molecular organometallic resist for EUV (MORE)

James Passarelli; Michael Murphy; Ryan Del Re; Miriam Sortland; Levi Dousharm; Michaela Vockenhuber; Yasin Ekinci; Mark Neisser; Daniel A. Freedman; Robert L. Brainard

doi:10.1117/12.2086599

20 March 2015 High-sensitivity molecular organometallic resist for EUV (MORE)

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Levi Dousharm, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel A. Freedman, Robert L. Brainard

Author Affiliations +

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 94250T (2015) https://doi.org/10.1117/12.2086599
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

We have developed organometallic carboxylate compounds [R_nM(O₂CR’)₂] capable of acting as negativetone EUV resists. Overall, the best and fastest resists contain antimony, are pentavalent and the carboxylate group contains a polymerizable olefin (e.g. acrylate, methacrylate or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of molecules of the type R_nM(O₂CR’)₂ where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O₂CR’). We found that the greatest predictor of sensitivity of the R_nSb(O₂CR’)₂resists is their level of polymerizable olefins. We mathematically define the polymerizable olefin loading (POL) as the ratio of the number of olefins vs. the number of non-hydrogen atoms. Linear and log plots of E_max vs. POL for a variety of molecules of the type R₃Sb(O₂CR’)₂ lend insight into the behaviour of these resists.

Citation Download Citation

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Levi Dousharm, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel A. Freedman, and Robert L. Brainard "High-sensitivity molecular organometallic resist for EUV (MORE)", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94250T (20 March 2015); https://doi.org/10.1117/12.2086599

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