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Proceedings Article

Analysis of the self-assembling and the defect annihilation processes in DSA using meso-scale simulation

[+] Author Affiliations
Hiroshi Morita, Yuki Norizoe

National Institute of Advanced Industrial Science and Technology (Japan)

Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942510 (March 23, 2015); doi:10.1117/12.2085650
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From Conference Volume 9425

  • Advances in Patterning Materials and Processes XXXII
  • Thomas I. Wallow; Christoph K. Hohle
  • San Jose, California, United States | February 22, 2015

abstract

Recently, directed self-assembly (DSA) method is focused on as a next generation lithography technique. We performed the DPD simulations to analyze the self-assembling process of block copolymer in DSA using OCTA (in detail, see http://octa.jp) system. Using DPD simulation, we can obtain the phase separated structures at each moment consisted by block copolymer chains. As those structures are consisted by polymer chains, an analysis can be done on those structures. In this paper, we study the dynamics of end particles in the defect annihilation process to understand the dynamics of self-assembling of block copolymer in DSA. From our analysis, the end particles moves in advance than the change of domain structure in the defect annihilation process. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Hiroshi Morita and Yuki Norizoe
" Analysis of the self-assembling and the defect annihilation processes in DSA using meso-scale simulation ", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942510 (March 23, 2015); doi:10.1117/12.2085650; http://dx.doi.org/10.1117/12.2085650


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