Base developable negative tone molecular resist based on epoxide cross-linking

Brandon Sharp; Richard A. Lawson; Ashten Fralick; Hannah Narcross; Jun Sung Chun; Mark Neisser; Laren M. Tolbert; Clifford L. Henderson

doi:10.1117/12.2086039

20 March 2015 Base developable negative tone molecular resist based on epoxide cross-linking

Brandon Sharp, Richard A. Lawson, Ashten Fralick, Hannah Narcross, Jun Sung Chun, Mark Neisser, Laren M. Tolbert, Clifford L. Henderson

Author Affiliations +

Proceedings Volume 9425, Advances in Patterning Materials and Processes XXXII; 94251S (2015) https://doi.org/10.1117/12.2086039
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

A negative tone, aqueous base developable molecular glass resist, 3Ep, is presented that is developable in both standard organic solvents and aqueous base developers. The resist shows slightly better imaging performance in organic solvent versus aqueous base and shows a shift of E0 away from zero dose. Compared to a previously reported 4Ep resist, 3Ep appears to have a more controlled polymerization rate at equivalent conditions, which results in higher-quality patterned features. 3Ep also requires use of an underlayer to avoid de-wetting during aqueous base development.

Citation Download Citation

Brandon Sharp, Richard A. Lawson, Ashten Fralick, Hannah Narcross, Jun Sung Chun, Mark Neisser, Laren M. Tolbert, and Clifford L. Henderson "Base developable negative tone molecular resist based on epoxide cross-linking", Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251S (20 March 2015); https://doi.org/10.1117/12.2086039

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