We demonstrate numerically that oblique off-axis illumination could enhance the contrast and extend the depth of focus of EUV phase defects detection. In addition to quantitative observation, it also allows us to extract the resolution-limited defect phase profiles quantitatively. This scheme can be easily implemented in both full field and scanning mask inspection tools.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xibin Zhou ; Dominic Ashworth ; Frank Goodwin and Kevin Cummings
Application of differential phase contrast imaging to EUV mask inspection: a numerical study
", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221E (April 6, 2015); doi:10.1117/12.2085945; http://dx.doi.org/10.1117/12.2085945