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Proceedings Article

Application of differential phase contrast imaging to EUV mask inspection: a numerical study

[+] Author Affiliations
Xibin Zhou, Dominic Ashworth, Frank Goodwin, Kevin Cummings

SEMATECH Inc. (United States)

Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221E (April 6, 2015); doi:10.1117/12.2085945
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From Conference Volume 9422

  • Extreme Ultraviolet (EUV) Lithography VI
  • Obert R. Wood; Eric M. Panning
  • San Jose, California, United States | February 22, 2015

abstract

We demonstrate numerically that oblique off-axis illumination could enhance the contrast and extend the depth of focus of EUV phase defects detection. In addition to quantitative observation, it also allows us to extract the resolution-limited defect phase profiles quantitatively. This scheme can be easily implemented in both full field and scanning mask inspection tools. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Xibin Zhou ; Dominic Ashworth ; Frank Goodwin and Kevin Cummings
" Application of differential phase contrast imaging to EUV mask inspection: a numerical study ", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221E (April 6, 2015); doi:10.1117/12.2085945; http://dx.doi.org/10.1117/12.2085945


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