Evaluation of  rinse material and process for EUV lithography

Kazuma Yamamoto; Toshiro Itani

doi:10.1117/12.2085282

6 April 2015 Evaluation of rinse material and process for EUV lithography

Kazuma Yamamoto, Toshiro Itani

Proceedings Volume 9422, Extreme Ultraviolet (EUV) Lithography VI; 94221Y (2015) https://doi.org/10.1117/12.2085282
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

Extreme ultraviolet lithography (EUVL) is the most promising option for future manufacturing of IC devices at sub-10nm node. However, resist pattern collapse is one concern for high volume manufacturing. To mitigate resist pattern collapse, rinse material is applied for EUVL. However at narrow pitches, it was found that some rinse materials caused pattern bridging and critical dimension (CD) shift. In this study, we suggest a model of resist deformation by surfactant penetration to resist pattern. Moreover, we focused on affinity between resist and surfactant which is main components in rinse material to clarify the pattern bridging and CD-shift issue by inducing surfactant penetration to resist pattern. To define the affinity between each material, Solubility Parameter (SP) value and Difference of Solubility Parameter value (DSP) of each material was calculated. The relation between surfactant penetration and DSP of each material was investigated. To clarify the relation, stress test was applied to enhance pattern deformation. As a result, it can be said that there is good correlation between surfactant penetration and SP value. Using these studies, rinse material design with low affinity surfactant for resist was able to achieve no CD-shift and less pattern bridging defect number.

Citation Download Citation

Kazuma Yamamoto and Toshiro Itani "Evaluation of rinse material and process for EUV lithography", Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221Y (6 April 2015); https://doi.org/10.1117/12.2085282

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available