Femtosecond laser-based production of 3D micro- and nano- devices in transparent substrate: a step toward system-materials

Yves Bellouard

doi:10.1117/12.2086709

14 April 2015 Femtosecond laser-based production of 3D micro- and nano- devices in transparent substrate: a step toward system-materials

Yves Bellouard

Author Affiliations +

Proceedings Volume 9351, Laser-based Micro- and Nanoprocessing IX; 93510G (2015) https://doi.org/10.1117/12.2086709
Event: SPIE LASE, 2015, San Francisco, California, United States

Abstract

Femtosecond laser irradiation applied to Fused Silica (the amorphous form of SiO₂) defines a novel technology platform for highly integrated all-optical microsystems and beyond. In contrast with common approaches that rely on combining materials to achieve particular functions, femtosecond-laser fabricated microsystems rely on single material monolith, whose properties are locally and in the three-dimension functionalized by selective exposure. The combination of laserfunctionalized zones with different physical properties allows us to direct-write integrated systems without the need for further assembly of packaging steps or without the need for multiple processing steps, like for instance sequences of layers deposition, exposure and etching steps.

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Yves Bellouard "Femtosecond laser-based production of 3D micro- and nano- devices in transparent substrate: a step toward system-materials", Proc. SPIE 9351, Laser-based Micro- and Nanoprocessing IX, 93510G (14 April 2015); https://doi.org/10.1117/12.2086709

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