High performance ILT for hotspots repair with hierarchical pattern matching

Kyohei Sakajiri

doi:10.1117/12.2192929

9 July 2015 High performance ILT for hotspots repair with hierarchical pattern matching

Kyohei Sakajiri

Proceedings Volume 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII; 96580B (2015) https://doi.org/10.1117/12.2192929
Event: Photomask Japan 2015, 2015, Yokohama, Japan

Abstract

Inverse lithography technology (ILT) has become one of the key technologies in recent years for highly optimized mask synthesis of physical layout of large scale semiconductor designs. Localized printability enhancement (LPE) has also proved useful in applying computational lithography to repair so-called hotspots to efficiently refine the designs for better process windows without re-optimizing the entire design. Although such a localized design refinement on a relatively small number of hotspots is already quite useful, in reality, it is possible that there are a large number of hotspots, thereby necessitating handling of large volume data in the repair flow. In the case of memory designs, in particular, the number of hotspots in highly repetitive patterns can be enormous, if they are counted from the flattened layout point of view. Since hotspots on repetitive patterns tend to involve processing of repeated patterns, applying pattern matching techniques becomes a natural solution such that only one instance of the repeated patterns is fully re-optimized and its result is copied and pasted over the remaining instances of the same pattern. It is also important to take advantage of the design hierarchy, because flattening of layers in repetitive hierarchical designs can result in data volume expansion that is so massive that even trivial operations such as copying and Boolean operations could become prohibitively slow. We present techniques to exploit pattern matching as well as hierarchical processing to achieve a high performance distributed hotspots reoptimization flow.

Citation Download Citation

Kyohei Sakajiri "High performance ILT for hotspots repair with hierarchical pattern matching ", Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII, 96580B (9 July 2015); https://doi.org/10.1117/12.2192929

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Image classification

Transform theory

Double patterning technology

Lithography

Liquid phase epitaxy

Computational lithography

Photomasks

Show All Keywords

Keywords/Phrases

Search In:

Publication Years