Examination of the quality of 120 degree silicon double mirror for a micro-optical laser gyroscope

Thalke Niesel; Ingmar Leber; Andreas Dietzel

doi:10.1117/12.2188318

27 August 2015 Examination of the quality of 120 degree silicon double mirror for a micro-optical laser gyroscope

Thalke Niesel, Ingmar Leber, Andreas Dietzel

Proceedings Volume 9575, Optical Manufacturing and Testing XI; 957502 (2015) https://doi.org/10.1117/12.2188318
Event: SPIE Optical Engineering + Applications, 2015, San Diego, California, United States

Abstract

120° silicon double mirrors for use in a novel micro optical resonator laser gyroscope have been developed in order to maximize the robustness of the sensor design against alignment errors. The idea being pursued is that the angle between these two mirrors can be intrinsically defined by silicon crystallography which enables a well-defined resulting reflection angle that is robust against mirror misalignment. As a consequence, resonator losses resulting from misalignment can be minimized. This work describes the concept of a new type of optical micro-gyroscope with double mirrors and its design. The mirrors are made from silicon wafers which are slightly deviating from perfect (100) orientation and thus allow to create <111> facets oriented 60° against the surface instead of 54,7° by wet etching. Two likewise structured wafers are connected by silicon direct bonding and separated into double mirror elements. These elements are mounted on a test platform to assess the quality and to confirm the suitability of a gyroscope. In this setup various possible misalignments were simulated. The experiments confirm the predicted misalignment robustness.

Citation Download Citation

Thalke Niesel, Ingmar Leber, and Andreas Dietzel "Examination of the quality of 120 degree silicon double mirror for a micro-optical laser gyroscope", Proc. SPIE 9575, Optical Manufacturing and Testing XI, 957502 (27 August 2015); https://doi.org/10.1117/12.2188318

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