Optomechanical design and tolerance of a microscope objective at 121.6 nm

Derek S. Keyes; Thiago S. Jota; Weichuan Gao; Dakota Luepke; Victor Densmore; Young-Sik Kim; Gun-Hee Kim; Thomas D. Milster

doi:10.1117/12.2188803

27 August 2015 Optomechanical design and tolerance of a microscope objective at 121.6 nm

Derek S. Keyes, Thiago S. Jota, Weichuan Gao, Dakota Luepke, Victor Densmore, Young-Sik Kim, Gun-Hee Kim, Thomas D. Milster

Author Affiliations +

Proceedings Volume 9575, Optical Manufacturing and Testing XI; 957506 (2015) https://doi.org/10.1117/12.2188803
Event: SPIE Optical Engineering + Applications, 2015, San Diego, California, United States

Abstract

By utilizing the Hydrogen-Lyman-α (HLA) source at 121.6 nm, we hope to achieve an intrinsic resolution of 247 nm at 0.3 numerical aperture (NA) and 92 nm at 0.8 NA. The motivation for 121.6 nm microscopy is the existence of a transparent window in the air absorption spectrum at that wavelength, which allows for the sample to be in air while the microscope is in an enclosed nitrogen environment. The microscope objective consists of two reflective optics and a LiF window, and it has been designed to demonstrate diffraction limited performance over a 160μm full field at 121.6 nm. The optomechanical design consists of mechanical subcells for each optical component, precision spacers and a barrel bore, which allow for submicron control of tolerance parameters.

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Derek S. Keyes, Thiago S. Jota, Weichuan Gao, Dakota Luepke, Victor Densmore, Young-Sik Kim, Gun-Hee Kim, and Thomas D. Milster "Optomechanical design and tolerance of a microscope objective at 121.6 nm", Proc. SPIE 9575, Optical Manufacturing and Testing XI, 957506 (27 August 2015); https://doi.org/10.1117/12.2188803

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