The best of both worlds: automated CMP polishing of channel-cut monochromators

Elina Kasman; Mark Erdmann; Stanislav Stoupin

doi:10.1117/12.2196034

3 September 2015 The best of both worlds: automated CMP polishing of channel-cut monochromators

Elina Kasman, Mark Erdmann, Stanislav Stoupin

Proceedings Volume 9590, Advances in Laboratory-based X-Ray Sources, Optics, and Applications IV; 95900D (2015) https://doi.org/10.1117/12.2196034
Event: SPIE Optical Engineering + Applications, 2015, San Diego, California, United States

Abstract

The use of a channel-cut monochromator is the most straightforward method to ensure that the two reflection surfaces maintain alignment between crystallographic planes without the need for complicated alignment mechanisms. Three basic characteristics that affect monochromator performance are: subsurface damage which contaminates spectral purity; surface roughness which reduces efficiency due to scattering; and surface figure error which imparts intensity structure and coherence distortion in the beam. Standard chemical-mechanical polishing processes and equipment are used when the diffracting surface is easily accessible, such as for single-bounce monochromators. Due to the inaccessibly of the surfaces inside a channel-cut monochromator for polishing, these optics are generally wet-etched for their final processing. This results in minimal subsurface damage, but very poor roughness and figure error. A new CMP channel polishing instrument design is presented which allows the internal diffracting surface quality of channel-cut crystals to approach that of conventional single-bounce monochromators.

Citation Download Citation

Elina Kasman, Mark Erdmann, and Stanislav Stoupin "The best of both worlds: automated CMP polishing of channel-cut monochromators", Proc. SPIE 9590, Advances in Laboratory-based X-Ray Sources, Optics, and Applications IV, 95900D (3 September 2015); https://doi.org/10.1117/12.2196034

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