Presentation + Paper
3 September 2015 Lithographically defined 3-dimensional graphene scaffolds
D. Bruce Burckel, Xiaoyin Xiao, Ronen Polsky
Author Affiliations +
Abstract
Interferometrically defined 3D photoresist scaffolds are formed through a series of three successive two-beam interference exposures, a post exposure bake and development. Heating the resist scaffold in a reducing atmosphere to > 1000 °C, results in the conversion of the resist structure into a carbon scaffold through pyrolysis, resulting in a 3D sp3- bonded glassy carbon scaffold which maintains the same in-plane morphology as the resist despite significant shrinkage. The carbon scaffolds are readily modified using a variety of deposition methods such as electrochemical, sputtering and CVD/ALD. Remarkably, sputtering metal into scaffolds with ~ 5 unit cells tall results in conformal coating of the scaffold with the metal. When the metal is a transition metal such as nickel, the scaffold can be re-annealed, during which time the carbon diffuses through the nickel, emerging on the exterior of the nickel as sp2-bonded carbon, termed 3D graphene. This paper details the fabrication, characterization and some potential applications for these structures.
Conference Presentation
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. Bruce Burckel, Xiaoyin Xiao, and Ronen Polsky "Lithographically defined 3-dimensional graphene scaffolds", Proc. SPIE 9552, Carbon Nanotubes, Graphene, and Emerging 2D Materials for Electronic and Photonic Devices VIII, 955204 (3 September 2015); https://doi.org/10.1117/12.2191845
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KEYWORDS
Carbon

Graphene

Nickel

Photoresist materials

Metals

Sputter deposition

Coating

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