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Proceedings Article

Ion implantation for figure correction of thin X-ray telescope mirror substrates

[+] Author Affiliations
Brandon Chalifoux, Graham Wright

Massachusetts Institute of Technology (United States)

Ralf K. Heilmann, Mark L. Schattenburg

MIT Kavli Institute for Astrophysics and Space Research (United States)

Proc. SPIE 9603, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII, 96031K (September 4, 2015); doi:10.1117/12.2189826
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From Conference Volume 9603

  • Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII
  • Stephen L. O'Dell; Giovanni Pareschi
  • San Diego, California, United States | August 09, 2015

abstract

Figure correction of X-ray telescope mirrors will be critical for future missions that require high angular resolution and large collecting areas. In this paper, we show that ion implantation offers a method of correcting figure errors by imparting sub-surface in-plane stress in a controllable magnitude and location in Schott D-263 glass, Corning Eagle XG glass, and crystalline silicon substrates. In addition, we can in theory achieve nearly exact corrections in Schott D-263 glass, by controlling the direction of the stress. We show that sufficient stress may be applied to Schott D-263 glass to achieve figure correction in mirrors with simulated initial figure errors. We also report on progress of a system that will be capable of correcting conical shell mirror substrates. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Brandon Chalifoux ; Graham Wright ; Ralf K. Heilmann and Mark L. Schattenburg
" Ion implantation for figure correction of thin X-ray telescope mirror substrates ", Proc. SPIE 9603, Optics for EUV, X-Ray, and Gamma-Ray Astronomy VII, 96031K (September 4, 2015); doi:10.1117/12.2189826; http://dx.doi.org/10.1117/12.2189826


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