Paper
11 September 2015 Raman studies of C-Ni/Ti films deposited on Si (100)
Author Affiliations +
Proceedings Volume 9662, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2015; 966249 (2015) https://doi.org/10.1117/12.2205546
Event: XXXVI Symposium on Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments (Wilga 2015), 2015, Wilga, Poland
Abstract
The thin films of carbon-nickel (C-Ni) nanocoposites were deposited on Ti-evaporated Si (100) substrate using Physical Vapour Deposition (PVD) method. Influence of evaporated titanium on carbonaceous structure of C-Ni films were investigated by Raman spectroscopy method. The fullerite-graphite structure was recognize using principal component analysis (PCA) of obtained Raman spectra.
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R. Belka, J. Keczkowska, M. Suchańska, P. Firek, H. Wronka, J. Radomska, and E. Czerwosz "Raman studies of C-Ni/Ti films deposited on Si (100)", Proc. SPIE 9662, Photonics Applications in Astronomy, Communications, Industry, and High-Energy Physics Experiments 2015, 966249 (11 September 2015); https://doi.org/10.1117/12.2205546
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KEYWORDS
Silicon

Raman spectroscopy

Carbon

Fullerenes

Principal component analysis

Titanium

Thin films

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