Fabrication of metasurface-based infrared absorber structures using direct laser write lithography

Ihar Fanyaeu; Vygantas Mizeikis

doi:10.1117/12.2211961

14 March 2016 Fabrication of metasurface-based infrared absorber structures using direct laser write lithography

Ihar Fanyaeu, Vygantas Mizeikis

Proceedings Volume 9759, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IX; 975917 (2016) https://doi.org/10.1117/12.2211961
Event: SPIE OPTO, 2016, San Francisco, California, United States

Abstract

We report fabrication and optical properties of ultra-thin polarization-invariant electromagnetic absorber metasurface for infra-red spectral. The absorber structure, which uses three-dimensional architecture is based on single-turn metallic helices arranged into a periodic square lattice on a metallic substrate, is expected to exhibit total resonant absorption due to balanced coupling between resonances of the helices. The structure was designed using numerical simulations aiming to tune the total absorption resonance to infra-red wavelength range by appropriately downscaling the unit cell of the structure, and taking into account dielectric dispersion and losses of the metal. The designed structures were subsequently fabricated using femtosecond direct laser write technique in a dielectric photoresist, and subsequent metallisation by gold sputtering. In accordance with the expectations, the structure was found to exhibit resonant absorption centred near the wavelength of 6 - 9 µm, with peak absorption in excess of 82%. The absorber metasurface may be applied in various areas of science and technology, such as harvesting infra-red radiation in thermal detectors and energy converters.

Citation Download Citation

Ihar Fanyaeu and Vygantas Mizeikis "Fabrication of metasurface-based infrared absorber structures using direct laser write lithography", Proc. SPIE 9759, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IX, 975917 (14 March 2016); https://doi.org/10.1117/12.2211961

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KEYWORDS

Absorption

Polarizability

Photoresist materials

Electromagnetism

Magnetism

Reflectivity

Fabrication

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